JPH0334656B2 - - Google Patents

Info

Publication number
JPH0334656B2
JPH0334656B2 JP56143799A JP14379981A JPH0334656B2 JP H0334656 B2 JPH0334656 B2 JP H0334656B2 JP 56143799 A JP56143799 A JP 56143799A JP 14379981 A JP14379981 A JP 14379981A JP H0334656 B2 JPH0334656 B2 JP H0334656B2
Authority
JP
Japan
Prior art keywords
film
substrate
etching
mask
recess
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56143799A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5846648A (ja
Inventor
Sunao Shibata
Akira Kurosawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP14379981A priority Critical patent/JPS5846648A/ja
Priority to US06/384,648 priority patent/US4472874A/en
Priority to DE8282105074T priority patent/DE3279916D1/de
Priority to EP82105074A priority patent/EP0067419B1/en
Priority to CA000404883A priority patent/CA1191280A/en
Publication of JPS5846648A publication Critical patent/JPS5846648A/ja
Publication of JPH0334656B2 publication Critical patent/JPH0334656B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76—Making of isolation regions between components

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Local Oxidation Of Silicon (AREA)
  • Element Separation (AREA)
JP14379981A 1981-06-10 1981-09-14 半導体装置の製造方法 Granted JPS5846648A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP14379981A JPS5846648A (ja) 1981-09-14 1981-09-14 半導体装置の製造方法
US06/384,648 US4472874A (en) 1981-06-10 1982-06-03 Method of forming planar isolation regions having field inversion regions
DE8282105074T DE3279916D1 (en) 1981-06-10 1982-06-09 Method of manufacturing integrated circuit devices using dielectric isolation
EP82105074A EP0067419B1 (en) 1981-06-10 1982-06-09 Method of manufacturing integrated circuit devices using dielectric isolation
CA000404883A CA1191280A (en) 1981-06-10 1982-06-10 Method of forming plunar isolation regions having field inversion regions

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14379981A JPS5846648A (ja) 1981-09-14 1981-09-14 半導体装置の製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP20127590A Division JPH0738410B2 (ja) 1990-07-31 1990-07-31 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS5846648A JPS5846648A (ja) 1983-03-18
JPH0334656B2 true JPH0334656B2 (en]) 1991-05-23

Family

ID=15347243

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14379981A Granted JPS5846648A (ja) 1981-06-10 1981-09-14 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS5846648A (en])

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6269532A (ja) * 1985-09-21 1987-03-30 Mitsubishi Electric Corp 半導体集積回路装置およびその製造方法
US4883768A (en) * 1989-02-28 1989-11-28 United Technologies Corporation Mesa fabrication in semiconductor structures
JP2553694B2 (ja) * 1989-03-10 1996-11-13 松下電器産業株式会社 半導体装置およびその製造方法
JP4891044B2 (ja) * 2006-12-14 2012-03-07 三菱農機株式会社 トラクタの油圧装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5423230A (en) * 1977-07-22 1979-02-21 Mitsubishi Rayon Eng Kk Controlling system of sulfur oxide discharge amount contained in the combustion gas

Also Published As

Publication number Publication date
JPS5846648A (ja) 1983-03-18

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